Naslov: | On the thermal stability of multilayer optics for use with high X-ray intensities |
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Avtorji: | ID Zakharova, Margarita (Avtor) ID Rek, Zlatko (Avtor) ID Šarler, Božidar (Avtor) ID Bajt, Saša (Avtor) |
Datoteke: | PDF - Predstavitvena datoteka, prenos (4,44 MB) MD5: 84E8BA6C7122A8162A059C79D7406C4F
URL - Izvorni URL, za dostop obiščite https://opg.optica.org/ome/fulltext.cfm?uri=ome-14-8-1933&id=553006
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Jezik: | Angleški jezik |
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Tipologija: | 1.01 - Izvirni znanstveni članek |
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Organizacija: | IMT - Inštitut za kovinske materiale in tehnologije
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Povzetek: | High-intensity X-ray free electron laser (XFEL) beams require optics made of materials with minimal radiation absorption, high diffraction efficiency, and high radiation hardness. Multilayer Laue lenses (MLLs) are diffraction-based X-ray optics that can focus XFEL beams, as already demonstrated with tungsten carbide/silicon carbide (WC/SiC)-based MLLs. However, high atomic number materials such as tungsten strongly absorb X-rays, resulting in high heat loads. Numerical simulations predict much lower heat loads in MLLs consisting of low atomic number Z materials, although such MLLs have narrower rocking curve widths. In this paper, we first screen various multilayer candidates and then focus on Mo2C/SiC multilayer due to its high diffraction efficiency. According to numerical simulations, the maximum temperature in this multilayer should remain below 300°C if the MLL made out of this multilayer is exposed to an XFEL beam of 17.5 keV photon energy, 1 mJ energy per pulse and 10 kHz pulse repetition rate. To understand the thermal stability of the Mo2C/SiC multilayer, we performed a study on the multilayers of three different periods (1.5, 5, and 12 nm) and different Mo2C to SiC ratios. We monitored their periods, crystallinity, and stress as a function of annealing temperature for two different heating rates. The results presented in this paper indicate that Mo2C/SiC-based MLLs are viable for focusing XFEL beams without being damaged under these conditions. |
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Ključne besede: | x-ray optics, multilayer Laue lens, thermal stability, numerical simulation |
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Status publikacije: | Objavljeno |
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Verzija publikacije: | Objavljena publikacija |
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Datum objave: | 01.08.2024 |
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Založnik: | Optica Publishing Group |
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Leto izida: | 2024 |
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Št. strani: | str. 1933-1948 |
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Številčenje: | Vol. 14, iss. 8 |
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Izvor: | Združene države Amerike |
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PID: | 20.500.12556/DiRROS-21097 |
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UDK: | 535:519.62 |
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ISSN pri članku: | 2159-3930 |
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DOI: | 10.1364/OME.527226 |
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COBISS.SI-ID: | 200647939 |
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Opomba: | Nasl. z nasl. zaslona;
Opis vira z dne 4. 6. 2024;
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Datum objave v DiRROS: | 20.12.2024 |
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Število ogledov: | 31 |
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Število prenosov: | 15 |
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Metapodatki: | |
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