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Naslov:On the thermal stability of multilayer optics for use with high X-ray intensities
Avtorji:ID Zakharova, Margarita (Avtor)
ID Rek, Zlatko (Avtor)
ID Šarler, Božidar (Avtor)
ID Bajt, Saša (Avtor)
Datoteke:.pdf PDF - Predstavitvena datoteka, prenos (4,44 MB)
MD5: 84E8BA6C7122A8162A059C79D7406C4F
 
URL URL - Izvorni URL, za dostop obiščite https://opg.optica.org/ome/fulltext.cfm?uri=ome-14-8-1933&id=553006
 
Jezik:Angleški jezik
Tipologija:1.01 - Izvirni znanstveni članek
Organizacija:Logo IMT - Inštitut za kovinske materiale in tehnologije
Povzetek:High-intensity X-ray free electron laser (XFEL) beams require optics made of materials with minimal radiation absorption, high diffraction efficiency, and high radiation hardness. Multilayer Laue lenses (MLLs) are diffraction-based X-ray optics that can focus XFEL beams, as already demonstrated with tungsten carbide/silicon carbide (WC/SiC)-based MLLs. However, high atomic number materials such as tungsten strongly absorb X-rays, resulting in high heat loads. Numerical simulations predict much lower heat loads in MLLs consisting of low atomic number Z materials, although such MLLs have narrower rocking curve widths. In this paper, we first screen various multilayer candidates and then focus on Mo2C/SiC multilayer due to its high diffraction efficiency. According to numerical simulations, the maximum temperature in this multilayer should remain below 300°C if the MLL made out of this multilayer is exposed to an XFEL beam of 17.5 keV photon energy, 1 mJ energy per pulse and 10 kHz pulse repetition rate. To understand the thermal stability of the Mo2C/SiC multilayer, we performed a study on the multilayers of three different periods (1.5, 5, and 12 nm) and different Mo2C to SiC ratios. We monitored their periods, crystallinity, and stress as a function of annealing temperature for two different heating rates. The results presented in this paper indicate that Mo2C/SiC-based MLLs are viable for focusing XFEL beams without being damaged under these conditions.
Ključne besede:x-ray optics, multilayer Laue lens, thermal stability, numerical simulation
Status publikacije:Objavljeno
Verzija publikacije:Objavljena publikacija
Datum objave:01.08.2024
Založnik:Optica Publishing Group
Leto izida:2024
Št. strani:str. 1933-1948
Številčenje:Vol. 14, iss. 8
Izvor:Združene države Amerike
PID:20.500.12556/DiRROS-21097 Novo okno
UDK:535:519.62
ISSN pri članku:2159-3930
DOI:10.1364/OME.527226 Novo okno
COBISS.SI-ID:200647939 Novo okno
Opomba:Nasl. z nasl. zaslona; Opis vira z dne 4. 6. 2024;
Datum objave v DiRROS:20.12.2024
Število ogledov:31
Število prenosov:15
Metapodatki:XML DC-XML DC-RDF
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Gradivo je del revije

Naslov:Optical materials express
Skrajšan naslov:Opt. mater. express
Založnik:Optical Society of America
ISSN:2159-3930
COBISS.SI-ID:17733142 Novo okno

Gradivo je financirano iz projekta

Financer:Drugi - Drug financer ali več financerjev
Program financ.:Cluster of Excellence
Številka projekta:EXC 2056, project ID: 390715994
Naslov:CUI: Advanced Imaging of Matter

Financer:Drugi - Drug financer ali več financerjev
Program financ.:Center for Free-Electron Laser Science (CFEL)
Naslov:Innovative methods for imaging with the use of x-ray free-electron laser (XFEL) and synchrotron sources: simulation of gas-focused micro-jets

Financer:ARIS - Javna agencija za znanstvenoraziskovalno in inovacijsko dejavnost Republike Slovenije
Številka projekta:P2-0162
Naslov:Večfazni sistemi

Financer:ARIS - Javna agencija za znanstvenoraziskovalno in inovacijsko dejavnost Republike Slovenije
Številka projekta:J2-4477
Naslov:RAZVOJ INOVATIVNIH BREZMREŽNIH METOD ZA VEČFIZIKALNE IN VEČNIVOJSKE SIMULACIJE VRHUNSKIH TEHNOLOGIJ

Licence

Licenca:CC BY 4.0, Creative Commons Priznanje avtorstva 4.0 Mednarodna
Povezava:http://creativecommons.org/licenses/by/4.0/deed.sl
Opis:To je standardna licenca Creative Commons, ki daje uporabnikom največ možnosti za nadaljnjo uporabo dela, pri čemer morajo navesti avtorja.
Začetek licenciranja:02.07.2024
Vezano na:Version of Record valid from 2024-07-02 Text and Data Mining valid from 2024-07-02

Sekundarni jezik

Jezik:Slovenski jezik
Ključne besede:rentgenska optika, večplastna leča Laue, termična stabilnost, numerične simulacije


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