| Title: | On the thermal stability of multilayer optics for use with high X-ray intensities |
|---|
| Authors: | ID Zakharova, Margarita (Author)
ID Rek, Zlatko (Author)
ID Šarler, Božidar (Author)
ID Bajt, Saša (Author) |
|---|
| Files: |  PDF - Presentation file, download (4,44 MB)
MD5: 84E8BA6C7122A8162A059C79D7406C4F
 URL - Source URL, visit https://opg.optica.org/ome/fulltext.cfm?uri=ome-14-8-1933&id=553006
|
|---|
| Language: | English |
|---|
| Typology: | 1.01 - Original Scientific Article |
|---|
| Organization: |  IMT - Institute of Metals and Technology
|
|---|
| Abstract: | High-intensity X-ray free electron laser (XFEL) beams require optics made of materials with minimal radiation absorption, high diffraction efficiency, and high radiation hardness. Multilayer Laue lenses (MLLs) are diffraction-based X-ray optics that can focus XFEL beams, as already demonstrated with tungsten carbide/silicon carbide (WC/SiC)-based MLLs. However, high atomic number materials such as tungsten strongly absorb X-rays, resulting in high heat loads. Numerical simulations predict much lower heat loads in MLLs consisting of low atomic number Z materials, although such MLLs have narrower rocking curve widths. In this paper, we first screen various multilayer candidates and then focus on Mo2C/SiC multilayer due to its high diffraction efficiency. According to numerical simulations, the maximum temperature in this multilayer should remain below 300°C if the MLL made out of this multilayer is exposed to an XFEL beam of 17.5 keV photon energy, 1 mJ energy per pulse and 10 kHz pulse repetition rate. To understand the thermal stability of the Mo2C/SiC multilayer, we performed a study on the multilayers of three different periods (1.5, 5, and 12 nm) and different Mo2C to SiC ratios. We monitored their periods, crystallinity, and stress as a function of annealing temperature for two different heating rates. The results presented in this paper indicate that Mo2C/SiC-based MLLs are viable for focusing XFEL beams without being damaged under these conditions. |
|---|
| Keywords: | x-ray optics, multilayer Laue lens, thermal stability, numerical simulation |
|---|
| Publication status: | Published |
|---|
| Publication version: | Version of Record |
|---|
| Publication date: | 01.08.2024 |
|---|
| Publisher: | Optica Publishing Group |
|---|
| Year of publishing: | 2024 |
|---|
| Number of pages: | str. 1933-1948 |
|---|
| Numbering: | Vol. 14, iss. 8 |
|---|
| Source: | Združene države Amerike |
|---|
| PID: | 20.500.12556/DiRROS-21097  |
|---|
| UDC: | 535:519.62 |
|---|
| ISSN on article: | 2159-3930 |
|---|
| DOI: | 10.1364/OME.527226 |
|---|
| COBISS.SI-ID: | 200647939 |
|---|
| Note: | Nasl. z nasl. zaslona;
Opis vira z dne 4. 6. 2024;
|
|---|
| Publication date in DiRROS: | 20.12.2024 |
|---|
| Views: | 707 |
|---|
| Downloads: | 366 |
|---|
| Metadata: |    |
|---|
|
:
|
Copy citation |
|---|
| | | | Share: |  |
|---|
Hover the mouse pointer over a document title to show the abstract or click
on the title to get all document metadata. |
