| Title: | On the thermal stability of multilayer optics for use with high X-ray intensities |
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| Authors: | ID Zakharova, Margarita (Author)
ID Rek, Zlatko (Author)
ID Šarler, Božidar (Author)
ID Bajt, Saša (Author) |
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| Files: |  PDF - Presentation file, download (4,44 MB)
MD5: 84E8BA6C7122A8162A059C79D7406C4F
 URL - Source URL, visit https://opg.optica.org/ome/fulltext.cfm?uri=ome-14-8-1933&id=553006
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| Language: | English |
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| Typology: | 1.01 - Original Scientific Article |
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| Organization: |  IMT - Institute of Metals and Technology
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| Abstract: | High-intensity X-ray free electron laser (XFEL) beams require optics made of materials with minimal radiation absorption, high diffraction efficiency, and high radiation hardness. Multilayer Laue lenses (MLLs) are diffraction-based X-ray optics that can focus XFEL beams, as already demonstrated with tungsten carbide/silicon carbide (WC/SiC)-based MLLs. However, high atomic number materials such as tungsten strongly absorb X-rays, resulting in high heat loads. Numerical simulations predict much lower heat loads in MLLs consisting of low atomic number Z materials, although such MLLs have narrower rocking curve widths. In this paper, we first screen various multilayer candidates and then focus on Mo2C/SiC multilayer due to its high diffraction efficiency. According to numerical simulations, the maximum temperature in this multilayer should remain below 300°C if the MLL made out of this multilayer is exposed to an XFEL beam of 17.5 keV photon energy, 1 mJ energy per pulse and 10 kHz pulse repetition rate. To understand the thermal stability of the Mo2C/SiC multilayer, we performed a study on the multilayers of three different periods (1.5, 5, and 12 nm) and different Mo2C to SiC ratios. We monitored their periods, crystallinity, and stress as a function of annealing temperature for two different heating rates. The results presented in this paper indicate that Mo2C/SiC-based MLLs are viable for focusing XFEL beams without being damaged under these conditions. |
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| Keywords: | x-ray optics, multilayer Laue lens, thermal stability, numerical simulation |
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| Publication status: | Published |
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| Publication version: | Version of Record |
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| Publication date: | 01.08.2024 |
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| Publisher: | Optica Publishing Group |
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| Year of publishing: | 2024 |
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| Number of pages: | str. 1933-1948 |
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| Numbering: | Vol. 14, iss. 8 |
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| Source: | Združene države Amerike |
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| PID: | 20.500.12556/DiRROS-21097  |
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| UDC: | 535:519.62 |
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| ISSN on article: | 2159-3930 |
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| DOI: | 10.1364/OME.527226 |
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| COBISS.SI-ID: | 200647939 |
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| Note: | Nasl. z nasl. zaslona;
Opis vira z dne 4. 6. 2024;
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| Publication date in DiRROS: | 20.12.2024 |
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| Views: | 30 |
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| Downloads: | 15 |
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