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Title:On the thermal stability of multilayer optics for use with high X-ray intensities
Authors:ID Zakharova, Margarita (Author)
ID Rek, Zlatko (Author)
ID Šarler, Božidar (Author)
ID Bajt, Saša (Author)
Files:.pdf PDF - Presentation file, download (4,44 MB)
MD5: 84E8BA6C7122A8162A059C79D7406C4F
 
URL URL - Source URL, visit https://opg.optica.org/ome/fulltext.cfm?uri=ome-14-8-1933&id=553006
 
Language:English
Typology:1.01 - Original Scientific Article
Organization:Logo IMT - Institute of Metals and Technology
Abstract:High-intensity X-ray free electron laser (XFEL) beams require optics made of materials with minimal radiation absorption, high diffraction efficiency, and high radiation hardness. Multilayer Laue lenses (MLLs) are diffraction-based X-ray optics that can focus XFEL beams, as already demonstrated with tungsten carbide/silicon carbide (WC/SiC)-based MLLs. However, high atomic number materials such as tungsten strongly absorb X-rays, resulting in high heat loads. Numerical simulations predict much lower heat loads in MLLs consisting of low atomic number Z materials, although such MLLs have narrower rocking curve widths. In this paper, we first screen various multilayer candidates and then focus on Mo2C/SiC multilayer due to its high diffraction efficiency. According to numerical simulations, the maximum temperature in this multilayer should remain below 300°C if the MLL made out of this multilayer is exposed to an XFEL beam of 17.5 keV photon energy, 1 mJ energy per pulse and 10 kHz pulse repetition rate. To understand the thermal stability of the Mo2C/SiC multilayer, we performed a study on the multilayers of three different periods (1.5, 5, and 12 nm) and different Mo2C to SiC ratios. We monitored their periods, crystallinity, and stress as a function of annealing temperature for two different heating rates. The results presented in this paper indicate that Mo2C/SiC-based MLLs are viable for focusing XFEL beams without being damaged under these conditions.
Keywords:x-ray optics, multilayer Laue lens, thermal stability, numerical simulation
Publication status:Published
Publication version:Version of Record
Publication date:01.08.2024
Publisher:Optica Publishing Group
Year of publishing:2024
Number of pages:str. 1933-1948
Numbering:Vol. 14, iss. 8
Source:Združene države Amerike
PID:20.500.12556/DiRROS-21097 New window
UDC:535:519.62
ISSN on article:2159-3930
DOI:10.1364/OME.527226 New window
COBISS.SI-ID:200647939 New window
Note:Nasl. z nasl. zaslona; Opis vira z dne 4. 6. 2024;
Publication date in DiRROS:20.12.2024
Views:278
Downloads:119
Metadata:XML DC-XML DC-RDF
:
ZAKHAROVA, Margarita, REK, Zlatko, ŠARLER, Božidar and BAJT, Saša, 2024, On the thermal stability of multilayer optics for use with high X-ray intensities. Optical materials express [online]. 2024. Vol. 14, no. 8, p. 1933–1948. [Accessed 21 April 2025]. DOI 10.1364/OME.527226. Retrieved from: https://dirros.openscience.si/IzpisGradiva.php?lang=eng&id=21097
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Record is a part of a journal

Title:Optical materials express
Shortened title:Opt. mater. express
Publisher:Optical Society of America
ISSN:2159-3930
COBISS.SI-ID:17733142 New window

Document is financed by a project

Funder:Other - Other funder or multiple funders
Funding programme:Cluster of Excellence
Project number:EXC 2056, project ID: 390715994
Name:CUI: Advanced Imaging of Matter
Funder:Other - Other funder or multiple funders
Funding programme:Center for Free-Electron Laser Science (CFEL)
Name:Innovative methods for imaging with the use of x-ray free-electron laser (XFEL) and synchrotron sources: simulation of gas-focused micro-jets
Funder:ARIS - Slovenian Research and Innovation Agency
Project number:P2-0162
Name:Večfazni sistemi
Funder:ARIS - Slovenian Research and Innovation Agency
Project number:J2-4477
Name:RAZVOJ INOVATIVNIH BREZMREŽNIH METOD ZA VEČFIZIKALNE IN VEČNIVOJSKE SIMULACIJE VRHUNSKIH TEHNOLOGIJ

Licences

License:CC BY 4.0, Creative Commons Attribution 4.0 International
Link:http://creativecommons.org/licenses/by/4.0/
Description:This is the standard Creative Commons license that gives others maximum freedom to do what they want with the work as long as they credit the author.
Licensing start date:02.07.2024
Applies to:Version of Record valid from 2024-07-02 Text and Data Mining valid from 2024-07-02

Secondary language

Language:Slovenian
Keywords:rentgenska optika, večplastna leča Laue, termična stabilnost, numerične simulacije


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