Digital repository of Slovenian research organisations

Show document
A+ | A- | Help | SLO | ENG

Title:Reduction of graphene oxide flakes by treatment with non-equilibrium hydrogen plasma–review and challenges
Authors:ID Zelenak, František (Author)
ID Krumpolec, Richard (Author)
ID Kováčik, Dušan (Author)
ID Zaplotnik, Rok, Institut "Jožef Stefan" (Author)
ID Vesel, Alenka, Institut "Jožef Stefan" (Author)
ID Primc, Gregor, Institut "Jožef Stefan" (Author)
ID Mozetič, Miran, Institut "Jožef Stefan" (Author)
Files:URL URL - Source URL, visit https://link.springer.com/article/10.1007/s41614-026-00223-z
 
.pdf PDF - Presentation file, download (2,53 MB)
MD5: 59A4C9663E5614B134CE7609CE0B1B04
 
Language:English
Typology:1.02 - Review Article
Organization:Logo IJS - Jožef Stefan Institute
Abstract:Graphene oxide (GO) is a standard precursor for the synthesis of porous yet densely packed, graphene-like structures in films with a thickness of several micrometers, which are useful for electrodes in various electrochemical devices, such as supercapacitors, as well as for various sensors. As-synthesized GO films exhibit inadequate electrical conductivity because of a large concentration of oxygen chemically bonded to graphene sheets. Heating of GO films in a non-oxidizing atmosphere will cause thermal decomposition of GO by desorption of carbon oxides, which will result in numerous defects in the sheets and partial collapsing of the sheets. An alternative is the treatment of GO films with non-equilibrium hydrogen plasma, which causes reduction rather than decomposition of the GO sheets. The scientific literature on approaches to reducing GO samples by treatment with hydrogen plasma is reviewed, the results are critically evaluated, and the correlations between the reduction efficiency and processing parameters are drawn. Paradoxically, larger discharge powers lead to worse results, both in terms of the remaining oxygen concentration and electrical properties. A feasible explanation for this paradox is radiation damage, which is likely caused by energetic photons or ions. The recommendation for further experiments in this tremendously promising niche is also presented.
Keywords:graphene oxide, hydrogen plasma, carbon materials
Publication status:Published
Publication version:Version of Record
Submitted for review:26.01.2026
Article acceptance date:14.06.2026
Publication date:26.06.2026
Publisher:Springer Nature
Year of publishing:2026
Number of pages:str. 1-28
Numbering:Vol. 10, article no. 13
PID:20.500.12556/DiRROS-31014 New window
UDC:621.7+621.9
ISSN on article:2367-3192
DOI:10.1007/s41614-026-00223-z New window
COBISS.SI-ID:284223747 New window
Copyright:© The Author(s) 2026
Note:Nasl. z nasl. zaslona; Soavtorji iz Slovenije: Rok Zaplotnik, Alenka Vesel, Gregor Primc, Miran Mozetič; Opis vira z dne 9. 7. 2026;
Publication date in DiRROS:10.07.2026
Views:113
Downloads:103
Metadata:XML DC-XML DC-RDF
:
Copy citation
  
Share:Bookmark and Share


Hover the mouse pointer over a document title to show the abstract or click on the title to get all document metadata.

Record is a part of a journal

Title:Reviews of modern plasma physics
Shortened title:Rev. mod. plasma phys.
ISSN:2367-3192
COBISS.SI-ID:175526147 New window

Document is financed by a project

Funder:ARIS - Slovenian Research and Innovation Agency
Project number:L2-60139-2025
Name:Inovativna plazemsko pogojena sinteza superkondenzatorskih elektrod naslednje generacije z visoko gostoto moči iz zaloge grafenovega oksida

Funder:ARIS - Slovenian Research and Innovation Agency
Project number:P2-0082-2022
Name:Tankoplastne strukture in plazemsko inženirstvo površin

Funder:Ministry of Education, Youth and Sports of the Czech Republic
Project number:LM2023039

Licences

License:CC BY 4.0, Creative Commons Attribution 4.0 International
Link:http://creativecommons.org/licenses/by/4.0/
Description:This is the standard Creative Commons license that gives others maximum freedom to do what they want with the work as long as they credit the author.
Licensing start date:26.06.2026
Applies to:VoR

Secondary language

Language:Slovenian
Keywords:grafenov oksid, vodikova plazma, ogljikovi materiali


Back