| Title: | Heterogeneous surface recombination of oxygen atoms on vertically oriented multilayer graphene sheets deposited on a metal substrate |
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| Authors: | ID Paul, Domen, Institut "Jožef Stefan" (Author)
ID Mozetič, Miran, Institut "Jožef Stefan" (Author)
ID Primc, Gregor, Institut "Jožef Stefan" (Author)
ID Vesel, Alenka, Institut "Jožef Stefan" (Author)
ID Drev, Sandra, Institut "Jožef Stefan" (Author)
ID Zaplotnik, Rok, Institut "Jožef Stefan" (Author) |
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| Files: |  URL - Source URL, visit https://www.sciencedirect.com/science/article/pii/S0169433225013698
 PDF - Presentation file, download (15,75 MB)
MD5: 45061072908DF72543AD86B3A33C5890
Description: Raziskovalni podatki so na voljo:
https://doi.org/10.5281/zenodo.14203591
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| Language: | English |
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| Typology: | 1.01 - Original Scientific Article |
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| Organization: |  IJS - Jožef Stefan Institute
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| Abstract: | The kinetics of surface recombination of neutral oxygen atoms on nanocarbon deposited on oxidized cobalt catalyst in inductively coupled radiofrequency plasma sustained in propane in the H-mode is presented. The coefficient was measured in the range of temperatures between 300 and 800 K and pressures between 40 and 200 Pa. A deep minimum in the coefficient at 0.03–0.06 was observed and explained by a deposition of a rather smooth carbon film on the cobalt catalyst. Prolonged deposition caused the growth of perpendicularly oriented multilayer graphene sheets with the distance between the neighboring sheets around 100 nm. The large aspect ratio of the gaps, whose depth reached several micrometers after deposition time over 100 s, caused the trapping of oxygen atoms and, thus, numerous collisions with the graphene-like surface, so the coefficient increased for over an order of magnitude. The maximum coefficient over 0.5 was observed at low pressures and elevated temperatures. The evolution of the recombination coefficient was explained by the peculiarities of the binding sites for oxygen atoms on graphene surfaces. |
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| Keywords: | carbon nanowalls, plasma, oxygen, chemical vapor deposition |
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| Publication status: | Published |
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| Publication version: | Version of Record |
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| Submitted for review: | 26.11.2024 |
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| Article acceptance date: | 27.05.2025 |
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| Publication date: | 27.05.2025 |
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| Publisher: | Elsevier |
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| Year of publishing: | 2025 |
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| Number of pages: | str. 1-12 |
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| Numbering: | Vol. 707, [article no.] 163654 |
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| Source: | Nizozemska |
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| PID: | 20.500.12556/DiRROS-22673  |
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| UDC: | 537 |
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| ISSN on article: | 1873-5584 |
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| DOI: | 10.1016/j.apsusc.2025.163654 |
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| COBISS.SI-ID: | 238540291 |
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| Copyright: | © 2025 The Authors. |
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| Note: | Nasl. z nasl. zaslona;
Opis vira z dne 6. 6. 2025;
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| Publication date in DiRROS: | 17.06.2025 |
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| Views: | 483 |
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| Downloads: | 315 |
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