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Title:Atypical adsorption of hydrogen on native ultrathin aluminum oxide films
Authors:ID Poberžnik, Matic, Institut "Jožef Stefan" (Author)
ID Kokalj, Anton, Institut "Jožef Stefan" (Author)
Files:.pdf PDF - Presentation file, download (2,54 MB)
MD5: 8B58BD735613880DA69276967AB2327F
 
Language:English
Typology:1.01 - Original Scientific Article
Organization:Logo IJS - Jožef Stefan Institute
Abstract:We report on an unusual hydrogen adsorption mode on native ultrathin aluminum-oxide films. Based on systematic density-functional theory (DFT) calculations on a model oxide film of varying thickness—i.e., α–Al2O3(001) supported on Al(111)—we show that on ultrathin films, H preferentially adsorbs on surface Al ions instead of O ions, as one would expect from chemical intuition. The so-adsorbed H is in hydride form, and for ultrathin films, it gets the electron charge from Al atoms at the oxide/metal interface. In contrast, for thicker films, this electron transfer ceases, and the charge instead predominantly comes from the surface O ions, making H adsorbed at Al sites inferior to H adsorbed at O sites. We further show that H adsorbed at Al sites can lead to H2 formation, which we propose to be connected to the experimentally observed hydrogen evolution in pits formed during the pitting corrosion of aluminum, where the protective oxide film has considerably degraded and is very thin
Publication status:Published
Publication version:Version of Record
Submitted for review:27.08.2024
Article acceptance date:02.01.2025
Publication date:15.01.2025
Publisher:Elsevier
Year of publishing:2025
Number of pages:12 str.
Numbering:Vol. 58, Art. 105742
Source:Nizozemska
PID:20.500.12556/DiRROS-21966 New window
UDC:544
ISSN on article:2468-0230
DOI:10.1016/j.surfin.2025.105742 New window
COBISS.SI-ID:223117827 New window
Copyright:© 2025 The Authors.
Publication date in DiRROS:15.04.2025
Views:617
Downloads:156
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Record is a part of a journal

Title:Surfaces and interfaces
Publisher:Elsevier
ISSN:2468-0230
COBISS.SI-ID:526516249 New window

Document is financed by a project

Funder:ARIS - Slovenian Research and Innovation Agency
Project number:P2-0393
Name:Napredni materiali za nizkoogljično in trajnostno družbo

Licences

License:CC BY 4.0, Creative Commons Attribution 4.0 International
Link:http://creativecommons.org/licenses/by/4.0/
Description:This is the standard Creative Commons license that gives others maximum freedom to do what they want with the work as long as they credit the author.
Licensing start date:15.01.2025
Applies to:VoR

Secondary language

Language:Slovenian
Keywords:hidrid, ultra tenki filmi, vodik


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