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<metadata xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:dc="http://purl.org/dc/elements/1.1/"><dc:title>The effect of surface preparation on the protective properties of ▫$Al_2O_3$▫ and ▫$HfO_2$▫ thin films deposited on cp-titanium by atomic layer deposition</dc:title><dc:creator>Spajić,	Ivan	(Avtor)
	</dc:creator><dc:creator>Rodič,	Peter	(Avtor)
	</dc:creator><dc:creator>Šekularac,	Gavrilo	(Avtor)
	</dc:creator><dc:creator>Lekka,	Maria	(Avtor)
	</dc:creator><dc:creator>Fedrizzi,	Lorenzo	(Avtor)
	</dc:creator><dc:creator>Milošev,	Ingrid	(Avtor)
	</dc:creator><dc:publisher>Elsevier</dc:publisher><dc:date>2021</dc:date><dc:date>2025-05-08 14:58:28</dc:date><dc:type>Neznano</dc:type><dc:identifier>22197</dc:identifier><dc:identifier>UDK: 54</dc:identifier><dc:identifier>ISSN pri članku: 0013-4686</dc:identifier><dc:identifier>DOI: 10.1016/j.electacta.2020.137431</dc:identifier><dc:identifier>COBISS_ID: 37347587</dc:identifier><dc:source>Nizozemska</dc:source><dc:language>sl</dc:language><dc:rights>© 2020 The Authors.</dc:rights></metadata>
