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<rdf:RDF xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:dc="http://purl.org/dc/elements/1.1/"><rdf:Description rdf:about="https://dirros.openscience.si/IzpisGradiva.php?id=21578"><dc:title>Structural Insights and hydrogen retention in amorphous and crystalline tungsten oxide films</dc:title><dc:creator>Zavašnik,	Janez	(Avtor)
	</dc:creator><dc:creator>Shvalya,	Vasyl	(Avtor)
	</dc:creator><dc:creator>Kremer,	Kristof	(Avtor)
	</dc:creator><dc:creator>Schwarz-Selinger,	Thomas	(Avtor)
	</dc:creator><dc:creator>Jacob,	Wolfgang	(Avtor)
	</dc:creator><dc:description>We investigated structural characteristics of and hydrogen isotope interactions with thermally and electro chemically synthesized tungsten oxide (W-oxide) thin films (≤50 nm). Specifically, we assessed whether elec trochemically synthesized W-oxide could serve as a suitable proxy for thermally grown films in hydrogen interaction studies. The W-oxide thin films were exposed to low-energetic atomic deuterium (D) to explore the hydrogen uptake, retention, and intercalation effects of the W-oxide structure. The W-oxides were characterized using grazing incidence X-ray diffraction (GI-XRD), scanning and transmission electron microscopy (SEM, TEM), Raman spectroscopy, and Fourier-transform infrared spectroscopy (FTIR) before and after deuterium exposure. The thermally grown W-oxides are crystalline, composed of orthorhombic WO3, while the electrochemically grown W-oxides are amorphous with nanocrystalline domains. Deuterium retention studies revealed that the electrochemically grown W-oxides show higher initial D retention compared with their thermally grown coun terparts and lower D release over time during storage, suggesting stronger D binding within the amorphous matrix. Using ion beam analysis, we quantified the deuterium retention and examined the depth-resolved reduction of the oxide within the films following deuterium exposure</dc:description><dc:publisher>Elsevier</dc:publisher><dc:date>2025</dc:date><dc:date>2025-02-28 11:33:49</dc:date><dc:type>Neznano</dc:type><dc:identifier>21578</dc:identifier><dc:source>Nizozemska</dc:source><dc:language>sl</dc:language><dc:rights>© 2025 The Author(s)</dc:rights></rdf:Description></rdf:RDF>
